EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

V. V. Chernik; Черник В. В.

doi:10.31857/S2686740023050036

EFFECTIVE METHODS OF SYNTHESIS AND OPTIMIZATION OF A HOLOGRAPHIC MASK

Авторлар: Chernik V.V.¹
Мекемелер:
1. Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences
Шығарылым: Том 512, № 1 (2023)
Беттер: 44-50
Бөлім: ФИЗИКА
URL: https://cardiosomatics.ru/2686-7400/article/view/651840
DOI: https://doi.org/10.31857/S2686740023050036
EDN: https://elibrary.ru/OWHLPJ
ID: 651840

Дәйексөз келтіру

Толық мәтін

Ашық рұқсат
Рұқсат жабық

Рұқсат берілді
Рұқсат жабық

Рұқсат ақылы немесе тек жазылушылар үшін

Аннотация
Авторлар туралы
Әдебиет тізімі
Қосымша файлдар
Статистика

Аннотация

The paper presents several statements of the problems of synthesis of holographic mask in the form of optimization problems for quality of holographic images. An effective algorithm for the synthesis of holographic masks based on FFT with complexity O(NlnN), where N is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS and high-end chips. Experimental results are presented.

Негізгі сөздер

diffraction, computer-generated holography, optimization problems, photolithography

Авторлар туралы

V. Chernik

Ishlinsky Institute for Problems in Mechanics of the Russian Academy of Sciences

Хат алмасуға жауапты Автор.
Email: gungho424@gmail.com
Russia, Moscow

Әдебиет тізімі

Борисов М.В., Боровиков В.А., Гавриков А.А., Князьков Д.Ю., Раховский В.И., Челюбеев Д.А., Шамаев А.С. Методы создания и коррекции качества голографических изображений геометрических объектов с элементами субволновых размеров // ДАН. 2010. Т. 434. № 3. С. 332–336.
Rakhovsky V., Knyazkov D., Shamaev A., Chernik V., Gavrikov A., Chelyubeev D., Mikheev P., Borisov M. // Proc. European Mask and Lithography Conference. SPIE. 2012. V. 8352. 83520P.
Черник В.В. // Журнал Радиоэлектроники. 2017. № 1. С. 1–20.
Gabor D.A. // Nature. 1948. № 161. P. 777–778.
Колфилд Г. Оптическая голография. М.: Мир, 1982. 376 с.
Mack C.A. Fundamental Principles of Optical Lithography: The Science of Microfabrication.: John Wiley & Sons, 2007. 417 p.
Басс Ф.Г., Фукс И.М. Рассеяние волн на статистически неровной поверхности. М.: Наука, 1972. 424 с.
Черник В.В. // Труды VI международной конференции “Параллельные вычисления и задачи управления”. PACO’2012. Т. II. 2012.
Михеев П.А. // Вестн. Моск. ун-та. Сер. 15: Вычислительная математика и кибернетика. 2014. Т. 1. С. 15–22.
Borisov M., Chernik V., Merkushov L., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors. MEMS/NEMS and MOEMS. 2020. XXXIV. 113241J (2020) https://doi.org/10.1117/12.2552013
Borisov M., Chernik V., Shamaev A., Rakhovski V., Chelubeev D. // Proc. SPIE 11324. Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS. 2020. XXXIV; 1132417 (2020). https://doi.org/10.1117/12.2551936