Fermi level pinning on the (110) oxidized surface of AIII-Sb semiconductors
- Авторлар: Alekseev P.A.1, Smirnov A.N.1, Sharov V.A.1, Borodin B.R.1, Kunitsyna E.V.1
- 
							Мекемелер: 
							- Ioffe Physical-Technical Institute of the Russian Academy of Sciences
 
- Шығарылым: Том 87, № 6 (2023)
- Беттер: 829-832
- Бөлім: Articles
- URL: https://cardiosomatics.ru/0367-6765/article/view/654380
- DOI: https://doi.org/10.31857/S0367676523701430
- EDN: https://elibrary.ru/VLLSLD
- ID: 654380
Дәйексөз келтіру
Аннотация
Pinning of the Fermi level on the oxidized (110) surface of AIII-Sb semiconductors (GaSb, Ga0.78In0.22As0.18Sb0.82, Ga0.66Al0.34As0.025Sb0.975) was studied. It is shown that the Fermi level is pinned at 4.65 ± 0.1 eV from the vacuum level. The presence of Sb was shown for the photooxidized Ga0.78In0.22As0.18Sb0.82 and Ga0.66Al0.34As0.025Sb0.975 surfaces. The formation of Sb on the surface because of faster oxidation of group III elements results in pinning of the Fermi level at the same distance from the vacuum level in III-Sb compounds.
Авторлар туралы
P. Alekseev
Ioffe Physical-Technical Institute of the Russian Academy of Sciences
							Хат алмасуға жауапты Автор.
							Email: prokhor@mail.ioffe.ru
				                					                																			                												                								Russia, 194021, Saint-Petersburg						
A. Smirnov
Ioffe Physical-Technical Institute of the Russian Academy of Sciences
														Email: prokhor@mail.ioffe.ru
				                					                																			                												                								Russia, 194021, Saint-Petersburg						
V. Sharov
Ioffe Physical-Technical Institute of the Russian Academy of Sciences
														Email: prokhor@mail.ioffe.ru
				                					                																			                												                								Russia, 194021, Saint-Petersburg						
B. Borodin
Ioffe Physical-Technical Institute of the Russian Academy of Sciences
														Email: prokhor@mail.ioffe.ru
				                					                																			                												                								Russia, 194021, Saint-Petersburg						
E. Kunitsyna
Ioffe Physical-Technical Institute of the Russian Academy of Sciences
														Email: prokhor@mail.ioffe.ru
				                					                																			                												                								Russia, 194021, Saint-Petersburg						
Әдебиет тізімі
- Alekseev P.A., Dunaevskiy M.S., Cirlin G.E. et al. // Nanotechnology. 2018. V. 29. Art. No. 314003.
- Woodall J., Freeouf J. // J. Vacuum. Sci. Technol. 1981. V. 19. P. 794.
- Baier H.-U., Koenders L., Mönch W. // Solid State Comm. 1986. V. 58. P. 327.
- Spicer W. E., Lindau I., Skeath P. et al. // Phys. Rev. Lett. 1980. V. 44. P. 420.
- Marozas B., Hughes W., Du X. et al. // Opt. Mater. Express. 2018. V. 8. P. 1419.
- Andreev I., Il’inskaya N., Kunitsyna E. et al. // Semiconductors. 2013. V. 37. P. 949.
- Dunaevskiy M., Alekseev P., Girard P. et al. // J. Appl. Phys. 2012. V. 112. Art. No. 064112.
- Alekseev P., Dunaevskiy M., Kirilenko D. et al. // J. Appl. Phys. 2017. V. 121. Art. No. 074302.
- Su Y., Gan K., Hwang J., Tyan S. // J. Appl. Phys. 1990. V. 68. P. 5584.
- Haines M., Kerr T., Newstead S., Kirby P. // J. Appl. Phys. 1989. V. 65. P. 1942.
- Schwartz G., Gualtieri G., Griffiths J. et al. // J. Electrochem. Soc. 1980. V. 127. P. 2488.
- Michaelson H.B. // J. Appl. Phys. 1977. V. 48. P. 4729.
- Hasegawa H., Hideo O. // J. Vacuum. Sci. Technol. B. 1986. V. 4. P. 1130.
- Freeouf J., Woodall J. // Appl. Phys. Lett. 1981. V. 39. P. 727.
- Sharov V., Alekseev P., Fedorov V. et al. // Appl. Surf. Sci. 2021. V. 563. Art. No. 150018.
 
				
			 
						 
					 
						 
						 
						

 
  
  
  Мақаланы E-mail арқылы жіберу
			Мақаланы E-mail арқылы жіберу 
 Ашық рұқсат
		                                Ашық рұқсат Рұқсат берілді
						Рұқсат берілді Рұқсат ақылы немесе тек жазылушылар үшін
		                                							Рұқсат ақылы немесе тек жазылушылар үшін
		                                					

