编辑政策

宗旨及范围

Journal is covers technological, physical and circuit engineering problems in micro- and nanoelectronics. Special emphasis on new trends in lithography (optical, x-ray, electron, ion), etching, impurity implantation, deposition and planarization in submicron and nanometer scale.

 
 

出版周期

Periodicity: 6 issues a year.

 

购买新期

没有订阅的读者可以获得访问每一期的权利。以下是可供选择的获取权和支付方式。

Access for an Issue: 129.00 (USD)

You can purchase the access for all articles published in one issue. Access to articles will be provide for an unlimited time.

Access to issue allows you to read, download and print full text (PDF and HTML) of all articles, but does not allow to distribute, copy or reproduce articles materials until the end of the embargo period (3 years) since the publication of the article).

 

购买文章

没有订阅的读者可以获得访问每一期的权利。以下是可供选择的获取权和支付方式。

Access for an Article: 16.00 (USD)

You can purchase the access for the article to read, download and print its fulltext (PDF, HTML). Access to article will be provide for an unlimited time.

Purchased access does not allow to distribute, copy or reproduce article's materials until the end of the embargo period (3 years) since the publication of the article).

 

Indexing

Indexing:

  • RSCI
  • translated version in Scopus
  • VAK